Description
Additional information
| MANUFACTURER | Karl Süss |
|---|---|
| MODEL | MJB3 |
Samples
- Photomasks sizes : 75 mm maximum
- Samples sizes : 10 mm to 50 mm
Characteristics
- Spectral selection : Near UV or far UV (wide spectrum)
ROUTINE PROCESS
Contact mode Photolithography
On : positive resists
- Minimum feature size : 1 µm
- Resist thickness : 0.5 µm to 2 µm
